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| MoS2场效应晶体管的太赫兹近场显微成像表征 |
| Terahertz near-field microscopic imaging characterization of MoS2 field-effect transistors |
| 投稿时间:2025-03-17 |
| DOI:10.3969/j.issn.1005-5630.202503170053 |
| 中文关键词: 太赫兹散射式扫描近场光学显微镜 开尔文探针力显微镜 MoS2场效应晶体管 光激发 背栅调控 |
| 英文关键词:terahertz scattering-type scanning near-field optical microscopy Kelvin probe force microscopy MoS2 field-effect transistor photoexcitation back-gate control |
| 基金项目:国家重点研发计划(2023YFF0719200) |
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| 中文摘要: |
| 二维过渡金属硫化物(two-dimensional transition metal dichalcogenides,TMDs)因其独特的电学和光学特性,在下一代电子和光电器件中展现出巨大的应用潜力。但在微纳尺度,有关TMDs载流子分布的原位探测研究仍显不足。结合太赫兹散射式扫描近场光学显微镜(terahertz scattering-type scanning near-field optical microscopy,THz s-SNOM)和开尔文探针力显微镜(Kelvin probe force microscopy,KPFM),系统研究了少层MoS2场效应晶体管在光激发和背栅调控下的微纳尺度载流子分布与费米能级的变化。研究表明,THz s-SNOM能灵敏地探测由外场激发导致的器件沟道载流子浓度变化,并且能够对载流子的非均匀分布进行原位成像检测。此外,基于有限偶极子模型计算,建立了太赫兹近场信号与载流子浓度之间的定量关系,为深入理解光激发和背栅调控载流子行为的微观机制提供了有力支持。 |
| 英文摘要: |
| Two-dimensional transition metal dichalcogenides (TMDs) have shown great potential for applications in next-generation electronic and optoelectronic devices due to their unique electrical and optical properties. However, in-situ detection of carrier distribution at the micro- and nano-scale is insufficient. This study combined terahertz scattering scanning near-field optical microscopy (THz s-SNOM) and Kelvin probe force microscopy (KPFM) to systematically investigate the micro- and nano-scale carrier distribution and Fermi level changes in few-layer MoS2 field-effect transistors under photoexcitation and back-gate control. The results showed that THz s-SNOM could sensitively detect changes in carrier concentration in the device channel caused by external field excitation and could perform in situ imaging detection of non-uniform carrier distribution. Moreover, based on the calculation of the finite dipole model, a quantitative relationship between the terahertz near-field signal and carrier concentration was established, providing strong support for a deeper understanding of the microscopic mechanisms of carrier behavior under photoexcitation and back-gate control. |
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