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| 基于氙灯光源的光谱干涉薄膜测厚技术研究 |
| Research on thin film thickness measurement method based on spectral interferometry with Xenon lamp |
| 投稿时间：2024-03-11 |
| DOI：10.3969/j.issn.1005-5630.202403110047 |
| 中文关键词: 氙灯 宽光谱 薄膜厚度 光谱干涉 |
| 英文关键词:Xenon lamp broad spectrum thin film thickness spectral interference |
| 基金项目:上海市科技创新行动计划（19511104600） |
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| 摘要点击次数: 110 |
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| 中文摘要: |
| 利用氙灯光源宽光谱特性，结合薄膜光谱干涉原理，设计并搭建了一套大量程低成本薄膜厚度光学测量系统。比较研究了LED光源和宽谱氙灯光源的光谱干涉信号，提出了一种针对不同厚度薄膜的多模式薄膜厚度计算方法。从数十微米到百纳米厚度区间内，可以根据调制周期峰值数，分别采用傅里叶相位梯度法，极值法和光谱拟合法解算薄膜厚度。基于构建的实验系统，先后对4～30 μm系列标准厚度片，以及百纳米级硅基$ {\mathrm{S}\mathrm{i}\mathrm{O}}_{2} $薄膜样品开展膜厚测量实验。通过和商业仪器测量结果比对，验证了本文方法在大量程膜厚测量中的可行性和精度。本文研究对于拓展低成本光谱干涉膜厚测量技术的应用具有借鉴意义。 |
| 英文摘要: |
| In this paper, a low cost large-range optical measurement system for thin film thickness is designed and built by using the broad spectral characteristics of Xenon lamp and the principle of thin film spectral interferometry. The spectral interference signals of LED light source and wide-spectrum Xenon lamp source are compared, and a multi-modal method for thin films of different thicknesses is proposed. For thin films covering several hundred nanometers to tens of micrometers, the thickness calculation method can be selected from the Fourier phase gradient method, the peak points method and the spectrum fitting method. Through the construction of the experimental system, a series of 4-30 μm thick standard PET sheet samples and silicon-based $ {\mathrm{S}\mathrm{i}\mathrm{O}}_{2} $ film samples are successfully measured, and the results are compared with commercial film thickness measurement systems, which verifies the feasibility of the large range film thickness measurement using the proposed method. The research in this paper can be of reference to the expansion of the range of low cost spectral interferometric film thickness measurement technology. |
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