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| 立、卧式磁性复合流体抛光对比实验研究 |
| Comparative experiment on vertical and horizontal magnetic compound fluid polishing |
| 投稿时间：2018-03-09 |
| DOI：10.3969/j.issn.1005-5630.2018.05.012 |
| 中文关键词: 磁性复合流体 抛光 抛光特性 黄铜H26 |
| 英文关键词:magnetic compound fluid(MCF) polishing polishing performance brass H26 |
| 基金项目:国家自然科学基金（51575310） |
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| 摘要点击次数: 3153 |
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| 中文摘要: |
| 针对磁性复合流体（MCF）抛光的两种抛光头，进行MCF抛光特性对比实验研究。开展了黄铜H26的平面抛光实验，调查立式和卧式抛光头分别对工件材料去除率、表面形貌与粗糙度以及MCF水分损耗等抛光特性的影响。实验结果表明，卧式MCF抛光能够较快地降低表面粗糙度，获得较高的材料去除率，MCF水分损失相对较快；立式MCF抛光能够在相对较长时间内获得稳定的材料去除率和表面粗糙度，MCF水分损失也较为平稳。 |
| 英文摘要: |
| To polish two types of polishing heads with magnetic compound fluid(MCF),an experiment of MCF polishing performance carried out.The planar polishing experiment of brass H26 carried out to investigate the effects of vertical and horizontal polishing heads on the workpiece material such as removal rate,surface morphology and roughness,and MCF moisture loss.The experimental results show that the horizontal MCF polishing can reduce the surface roughness quickly and get a higher material removal rate.MCF moisture loss is relatively fast.The vertical MCF polishing can get a stable material removal rate in a relatively long time and surface roughness.MCF moisture loss is also relatively stable. |
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