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| 带校正环的物镜光学设计 |
| Optical design of objective with correction collar |
| 投稿时间:2015-08-31 |
| DOI:10.3969/j.issn.1005-5630.2016.03.008 |
| 中文关键词: 光学设计 盖玻片校正 无限远校正系统 |
| 英文关键词:optical design coverslip correct infinity-corrected system |
| 基金项目: |
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| 摘要点击次数: 3159 |
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| 中文摘要: |
| 利用软件Zemax设计一款可用于盖玻片校正的显微物镜,该物镜采用逆向光路设计,无限远校正系统,其放大倍数为40×,可见光波段,数值孔径为0.6,校正的盖玻片厚度范围为0~1.5 mm,管镜配合能满足Ф20 mm视场。从镜头专利库ZEBASE中选择合适的镜头作为初始结构,通过设定合理的优化函数优化该镜头,对最后的结果进行成像指标分析,该款物镜能满足使用要求。 |
| 英文摘要: |
| A microscope objective is designed to correct the coverslip by Zemax. The objective is optimized to infinity-corrected system by using the method of inverted optical path with visible wave-band.This objective with numerical aperture of 0.6 and magnification of 40 times can meet the field of Ф20 mm with tube lens. The objective can satisfy the application with coverslip thickness variate from 0 mm to 1.5 mm. The appropriate initial structure can get from lens patents of ZEBASE. The system is optimized by setting reasonable optimization operand. It satisfies requirements. |
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