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| 氮气反应溅射制备Co/Sb多层膜研究 |
| The research on Co/Sb multilayer in the nitrogen reactive sputtering |
| 投稿时间：2014-03-14 |
| DOI：10.3969/j.issn.1005-5630.2014.04.018 |
| 中文关键词: 反应溅射 多层膜 同步辐射 Co/Sb |
| 英文关键词:reactive sputtering multilayer synchrotron radiation Co/Sb |
| 基金项目:国家自然科学基金（11375131、11305104） |
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| 中文摘要: |
| 针对“水窗”波段（280～540 eV）对多层膜反射镜的应用需求，在Sb的M5吸收边（525.5 eV）附近，选择Co和Sb作为该能点的多层膜材料组合，优化设计膜系结构.采用直流磁控溅射方法制备了Co/Sb多层膜，通过在溅射气体氩气中引入氮气作为反应气体，多层膜界面粗糙度明显减小.利用X射线掠入射反射（GIXRR）测试多层膜结构，并在北京BSRF同步辐射3W1B实验站测量了反应溅射前后的多层膜反射率（SXR），结果表明：氮气含量为25%时的界面粗糙度最小，反射率从无反应溅射的7.2%提高到11.7%. |
| 英文摘要: |
| In order to understand the application of the "water window" energy region between 280 eV and 540 eV, we have studied the design and fabrication of multilayer films at the M5-absorption edge of Sb (525.5 eV). Co and Sb were chosen to make up the multilayer films. Firstly, we optimized the multilayer film structure. Secondly, Co/Sb multilayer films were deposited on Si substrate by the DC magnetron sputtering method and the quality of these films were improved by using reactive sputtering in a nitrogen-argon gas mixture. Lastly, the multilayer film structure was measured by grazing incident x-ray reflection measurement(GIXRR)and the reflectivity was measured by soft x-ray reflectivity(SXR)at Beijing Synchrotron Light Source (BSRF). The results have shown that when the fraction of nitrogen was 25%, the interface roughness was the least of all. The reflectivity was improved from 7.2% to 11.7%. |
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