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| 大视场投影光刻物镜的研究 |
| Research on the large field projection lithograph lens |
| 修订日期：2005-01-08 |
| DOI： |
| 中文关键词: 大视场,光刻物镜,分辨力,畸变 |
| 英文关键词:large field,lithography lenses,resolution,distortion |
| 基金项目: |
| 高波 庄华洁 马涛 沈亦兵 |
浙江大学现代光学仪器国家重点实验室 浙江杭州310027
(高波，庄华洁，马涛)
，浙江大学现代光学仪器国家重点实验室 浙江杭州310027(沈亦兵)
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| 中文摘要: |
| 大视场投影光刻物镜是光学系统中的一种特殊的形式,其设计加工要求高。针对研制的8英寸视场的投影光刻物镜,从光学设计要求出发,分析了影响光学系统成像质量的各种主要误差因素,通过ZEMAX模拟,确定了加工容差,并对其加工和装校过程做了阐述,对研制完成的物镜检验了其曝光分辨力和畸变特性,达到了系统设计的指标要求。 |
| 英文摘要: |
| The large field projection lithography lens is a special optical lenses form,which put an high demands on the design and processing both for mechanical and optical.In this presentation,based on the lithography lenses which can be used to exposure an 8 inch wafer by one step, we analyzed the various factors which may cause the image quality deterioration of the optical system especially for this type of lenses,by ZEMAX simulation we set the tolerance both for optical parts and mechanical parts,also the procedures of the adjustment and assembly for the whole lenses are described.By testing the resolution and distortion of this lenses,we found that the completed projection lenses reach the design specification. |
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