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| MPCVD法加偏压下金刚石膜的成核行为 |
| Nucleation behavior of diamond films under bias field by MPCVD |
| 修订日期:2004-11-28 |
| DOI: |
| 中文关键词: 金刚石膜,成核,MPCVD,侧向力显微(LFM |
| 英文关键词:diamond film,nucleation,MPCVD,lateral force microscopy(LFM) |
| 基金项目: |
| 刘传先 武文远 |
上海第二工业大学应用物理系 上海201209
(刘传先) ,解放军理工大学理学院 江苏南京210007(武文远)
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| 中文摘要: |
| 用微波等离子体化学气相沉积法(M PCVD),探讨了在S i(100)衬底上加偏压电场情况下金刚石膜的成核行为。侧向力显微(LFM)表明偏压电场对金刚石成核有促进作用,并分析了偏压电场促进金刚石成核的机制。 |
| 英文摘要: |
| In this paper, the nucleation behaviour of diamond films on Si(100) substrates is investigated with bias field by MPCVD. By the analysis of LFM, bias field can contribute to the diamond mucleation. The mechanism of contribution of bias field to the diamond nucleation has also been analysed. |
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