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| 二元光学元件的制作技术与进展 |
| Fabrication technology and development of binary optical elements |
| 修订日期:2004-07-26 |
| DOI: |
| 中文关键词: 二元光学,制作工艺,刻蚀,直写法 |
| 英文关键词:binary optics,fabrication technology,etching,direct writing |
| 基金项目: |
| 张羽 杨坤涛 杨长城 |
华中科技大学光电系 湖北武汉430074
(张羽,杨坤涛) ,华中光电技术研究所 湖北武汉430074(杨长城)
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| 中文摘要: |
| 综述了二元光学元件的常用制作工艺技术,包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。分析了这些方法的优缺点,并对其制作技术的发展进行了评述。 |
| 英文摘要: |
| The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks. The merit and defect of these technologies were analyzed, and the development of fabrication technology were summarized. |
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