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| 时间监控离子束溅射沉积光学薄膜的厚度修正 |
| Thickness modify of time-power monitoring of ion beam sputter depositing optical thin films |
| 修订日期:2003-11-30 |
| DOI: |
| 中文关键词: 离子束溅射,时间监控,光学厚度 |
| 英文关键词:ion beam sputter,time-power monitoring,optical thickness |
| 基金项目: |
| 刘洪祥 李凌辉 申林 熊胜明 张云洞 |
| 中国科学院光电技术研究所,中国科学院光电技术研究所,中国科学院光电技术研究所,中国科学院光电技术研究所,中国科学院光电技术研究所 四川成都610209,四川成都610209,四川成都610209,四川成都610209,四川成都610209 |
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| 全文下载次数: 23 |
| 中文摘要: |
| 通过单层和多层膜的实验模拟,研究了离子束溅射沉积速率和沉积时间的关系。在溅射镀膜的初始阶段,对于Ta2O5,沉积速率随时间增加而增大;对于SiO2,沉积速率随时间先显著地增加,随后逐渐地减小。结果表明,通过对高、低折射率各层的监控时间进行补偿,即可实现光学薄膜厚度的精确监控。 |
| 英文摘要: |
| In this paper, the rule of the deposition rate of films and the sputtering time was studied. In the preliminary stage of coating, for Ta_2O_5, its growth rate increases with the depositing time; but, for SiO_2, its growth rate increases firstly, and then decreases. Experiments showed that, by modifying the deposition time of the high-index and the low-index layers, this can realize the accurate thickness control of time-power monitoring of ion beam sputter depositing optical thin films. |
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