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| 离子束刻蚀光学薄膜的速率定标技术 |
| The confirmation of etch rate of optical thin film with ion etch technology |
| 修订日期:2003-11-30 |
| DOI: |
| 中文关键词: 膜厚测量,离子束刻蚀,数据拟合,光学薄膜 |
| 英文关键词:thickness measurement,ion etch,data fitting,optical thin film |
| 基金项目: |
| 林炳 刘定权 张凤山 |
| 中国科学院上海技术物理研究所,中国科学院上海技术物理研究所,中国科学院上海技术物理研究所 上海200083,上海200083,上海200083 |
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| 中文摘要: |
| 离子束刻蚀技术现在越来越多被应用在可见光乃至红外薄膜中,在这一技术中最为关键的环节就是如何精确地测量离子源对薄膜的刻蚀速率,此速率因不同材料不同工艺条件而变化。现在利用光谱测量与数据拟合的方法,能够快速简便地测定出被刻蚀的材料的物理厚度,从而标定离子束刻蚀的速率。 |
| 英文摘要: |
| Ion etch technology is being more and more used in fabricating visible and infrared thin film, the most important section of which is how to get the etch rate in etching optical thin film. The rate is greatly infected by different materials and parameters. We have combined spectrum measurement with data fitting to quickly obtain thickness of etched material, and then calculated the etch rate accurately. |
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