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| 等离子辅助镀膜技术在优质高产的镀膜系统中的应用 |
| PIAD for high productivity high performance coating systems |
| 修订日期：2003-11-30 |
| DOI： |
| 中文关键词: 等离子辅助沉积,溅射镀膜,光学镀膜 |
| 英文关键词:plasma ion assisted deposition(PIAD),sputtering coating,optical coatings |
| 基金项目: |
| 哈哥顿 哈洛 |
| 莱宝光学有限公司 阿淄诺63755 |
| 摘要点击次数: 2750 |
| 全文下载次数: 21 |
| 中文摘要: |
| 大规模生产高质量薄膜产品是今后镀膜设备需要解决的问题。等离子体或离子辅助镀膜现在被广泛应用于高质量膜系生产中并取得了良好的效果,但是主要由于等离子体或离子源的原因,产能不高。介绍了一种新型精密光学镀膜系统和一种新型溅射镀膜系统。新的系统能够优质高效地生产复杂膜系,特别适合大规模生产。 |
| 英文摘要: |
| Mass productions together with super layer qualities are a challenge for future coating equipment. Plasma-or ion-assisted coating processes is widely used for the production of high quality interference coatings. The special coating equipment produces complex interference filters,but their limited productivity makes them unsuitable for cost-effective production. The limitations for high output are the existing sources' restriction to evaporation rates. One kind of precision coating system and sputtering system have been developed and described in this paper. New coating system can manufacture complex coatings with high quality really economically, so especially fit for mass production of high requirement complex coatings. |
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