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| 离子辅助沉积TiO2光学薄膜的特性 |
| Properties of TiO2 film deposited by IAD process |
| 修订日期:2003-11-30 |
| DOI: |
| 中文关键词: 氧化钛光学薄膜(TiO2) 离子辅助沉积(IAD) 散射 应力 微观结构 |
| 英文关键词:TiO_2,IAD,Scattering,Stress,Microstructure, |
| 基金项目: |
| 范滨 唐骐 |
范滨(株式会社光驰,琦玉县,川越市,350-0801) ;唐骐(株式会社光驰,琦玉县,川越市,350-0801)
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| 中文摘要: |
| 阐述了用离子辅助沉积(IAD)工艺制备氧化钛(TiO2)光学薄膜的光学、应力及微观特性,并讨论了其与离子辅助沉积成膜工艺参数之间的相互关系. |
| 英文摘要: |
| The optical, stress and microstructure properties of TiO_2 film deposited by ion assisted deposition process were described in this paper. The relationship between these properties with IAD coating conditions was discussed. |
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