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| 磁控溅射工艺控制模式比较 |
| Evaluation of various process control modes in reactive magnetron sputtering |
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| DOI: |
| 中文关键词: 反应磁控溅射,溅射工艺控制,电介质薄膜 |
| 英文关键词:reactive magnetron sputtering,sputtering process control,dielectric thin films |
| 基金项目: |
| 郑舒颖 陈少扬 |
中南实业国际(深圳) 有限公司 MT8广东深圳518129
(郑舒颖) ,中南实业国际(深圳) 有限公司 MT8广东深圳518129(陈少扬)
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| 摘要点击次数: 2064 |
| 全文下载次数: 17 |
| 中文摘要: |
| 对各种磁控溅射的工艺参数控制技术进行比较 ,分析各自的特色 ,并指出光学厚度监控对于制备精密光学多层膜的反应溅射工艺的重要性 |
| 英文摘要: |
| Various process control modes in reactive magnetron sputtering were evaluated. As indicated in this paper, optical thickness monitoring was much more important in the precision optical multilayer production by reactive sputtering processes. |
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