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| ECR Plasma CVD淀积介质膜的工艺模拟 |
| Simulation Based Prediction of Refractive Index of Dielectric Thin Film Deposition by ECR Plasma CVD |
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| DOI: |
| 中文关键词: ECRPlasmaCVD,人工神经网络,气流配比,折射率 |
| 英文关键词:ECR Plasma CVD, Artificial Neural Network, Gas Ratio, Refractive Index. |
| 基金项目: |
| 谭满清 陆建祖 李玉鉴 |
| 中国科学院半导体研究所工程中心!北京100083 |
| 摘要点击次数: 2015 |
| 全文下载次数: 17 |
| 中文摘要: |
| 以实验数据为基础,运用人工神经网络方法,建立了电子回旋共振等离子体化学气相沉积(ECR Plasm a CVD)淀积硅的氮、氧化物介质膜折射率n 与气流配比Q(N2)/Q(SiH4)和Q(O2)/Q(SiH4)关系的数学模型,此模型在给定气流配比Q(N2 )/Q(SiH4)和Q(O2)/Q(SiH4)时所预测的成膜折射率跟实验值符合得很好,该数学模型为ECR Plasm a CVD淀积全介质光学膜的工艺模拟打下坚实的基础。 |
| 英文摘要: |
| Based on experiment result, a mathematical model has been established in this paper for the relation between refractive index n of silicon oxide or nitride and gas ratio Q(N 2)/Q(SiH 4),Q(O 2)/Q(SiH 4) by artificial neural network. A good prediction is made for the refractive index n by the model when gas ratioQ(N 2)/Q(SiH 4),Q(O 2)/Q(SiH 4) are given. And the model is basic of simulation for all dielectric optical coatings deposition by ECR plasma CVD. |
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