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| 光刻技术综述 |
| The Summary of the Lithography |
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| DOI: |
| 中文关键词: 光刻,激光,立体光刻 |
| 英文关键词:Lithography, Laser, Stereo lithography, |
| 基金项目: |
| 范华良 曹向群 |
| 浙江大学光科系 310027 杭州玉泉 |
| 摘要点击次数: 3402 |
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| 中文摘要: |
| 叙述了光刻技术在微电子、光学仪器制造中的发展情况,同时,介绍了近几年发展起来的立体光刻原理。 |
| 英文摘要: |
| In this paper, the development of the lithography in the fields of microelectronics and optical instrument mamufacture is descripted. At the same time, the principle of the stereo lithography, which is being developed recently, is introduced. |
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